Index
A
B
C
D
-  Data skew: 
Section 3: Chapter 2
 -  Defect: 
Section 3: Chapter 2, 
Section 4: Introduction, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 4
 -  Degradation: 
Section 4: Chapter 1
 -  Delta measurements: 
Section 4: Chapter 2
 -  Department of defense (DoD): 
Appendix 2
 -  DESC: 
Section 4: Chapter 4, 
Section 4: Chapter 4, 
Appendix 2, 
Appendix 2.
 -  Design: 
Section 1: Chapter 1, 
Section 1: Chapter 2, 
Section 3: Chapter 2
 -  Design cycle: 
Appendix 1
 -  Device (or process) learning factor: 
Appendix 7
 -  DFT. See Design: for test
 -  Die shear test: 
Section 4: Chapter 3
 -  Die-attach: 
Section 4: Chapter 1
 -  Doping profile: 
Section 4: Chapter 1
 
E
F
G
H
I
-  I/O: 
Section 3: Chapter 2, 
Section 3: Chapter 2
 -  IDD current limiting: 
Section 3: Chapter 4 
 -   IDDQ testing: 
Section 2: Chapter 5, 
 Section 3: Chapter 2, 
Section 4: Chapter 1, 
Section 4: Chapter 4
 -  IEEE standard 1149.1: 
Section 3: Chapter 3, 
Section 3: Chapter 3, 
Appendix 1
 -  Implementation: 
Section 3: Chapter 2
 -  In-line tests: 
Section 4: Chapter 4
 -  In-process monitoring:
Appendix 2
 -  Infant mortality: 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Appendix 7
 -  Information management: 
Section 1: Chapter 4
 -  Interconnections: 
Section 3: Chapter 2, 
Section 3: Chapter 2
 -  Interface traps: 
Section 3: Chapter 2
 -  Ionizing radiation: 
Section 3: Chapter 2
 
J
L
M
-  Marking Diagram:
Appendix 6
 -  Mask: 
Section 4: Chapter 4
 -  Metal stress voiding: 
Section 4: Chapter 
1
 -  Metallization: 
Section 4: Chapter 1, 
Section 4: Chapter 4
 -  MIL-H-38534: 
Section 4: Chapter 1
 -  MIL-HDBK-217:
Appendix 7, 
Appendix 7
 -  MIL-I-38535: 
Section 4: Chapter 1, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Appendix 2, 
Appendix 2, 
Appendix 3
 -  MIL-M-38510:
Appendix 2, 
Appendix 3
 -  MIL-S-19500:
Appendix 2
 -  MIL-STD-750:
Appendix 2
 -  MIL-STD-883: 
Section 2: Chapter 2, 
Section 4: Chapter 1, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Appendix 1, 
Appendix 2, 
Appendix 3
 -  MIL-STD-976:
Appendix 2
 -  MIL-STD-977:
Section 4: Chapter 1
 -  Modeling:
Section 4: Chapter 2
 -  Multi-chip devices:
Section 4: Chapter 
1
 -  Multiple-bit upset:
Section 3: Chapter 4
 
N
O
P
-  Packaging: 
Section 1: Chapter 3, 
Section 3: Chapter 2, 
Section 3: Chapter 2, 
Section 4: Chapter 1. See also 
Vendor evaluation: evaluating packaging
 -   Parametric monitor (PM): 
Appendix 2
 -   Parasitic bipolar transistor: 
Section 3: Chapter 4
 -   Part acceptance:
Section 1: Chapter 1, 
Section 1: Chapter 2, 
Section 4: Chapter 4
 -  Part count method: 
Appendix 7
 -  Part stress analysis method: 
Appendix 7
 -  Partitioning: 
Section 3: Chapter 2, 
Section 3: Chapter 2, 
Section 3: Chapter2
 -  PDA: 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Appendix 4
 -  Percent defective allowable. See PDA
 -  Performance: 
Section 3: Chapter 2
 -  Physical layout: 
Section 1: Chapter1
 -  Pin Assignment: 
Appendix 6
 -  Place and route: 
Appendix 1
 -  Planning
 -  Post-layout
 -  Power cycling: 
Section 3: Chapter 4
 -  Power dissipation: Section 3: Chapter 2
 -  Preliminary design review (PDR). See review process:  preliminary design 
review
 -  Process: 
Section 4: Chapter 3, 
Section 4: Chapter 3
 -  Process (or device) learning factor: 
Appendix 7
 -  Process control: 
Section 4: Chapter 3. See 
also Statistical process control
 -  Process maturity: 
Section 2: Chapter 3
 -  Process monitor: 
Section 4: Chapter 1
 -  Process technology: 
Section 2: Chapter 3
 -  Process variation: 
Section 4: Chapter 2
 -  Procurement: 
 -   Program budgeting. See ASIC: 
program: budgeting
 -   Proof-of-design parts: 
Section 4: Chapter 1
 -  Propagation delay: 
Section 4: Chapter 1
 -  Prototype: 
Section 4: Chapter 1, 
Section 4: Chapter 2
 -  Punchthrough: 
Section 4: Chapter 1
 
Q
-  QCI: 
Section 4: Chapter 2, 
Section 4: Chapter 2, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3
 -  QML: 
Section 2: Chapter 2, 
Section 4: Introduction, 
Section 4: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 4, 
Appendix 1, 
Appendix 4.  See also Government qualification programs; 
Screening: QML and QPL methods
 -  QMP. See Quality Management Plan
 -  QPL: 
Section 2: Chapter 2, 
Section 4: Introduction, 
Section 4: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 4, 
Appendix 1, 
Appendix 4.  See also Government qualification programs; 
Screening: QML and QPL  methods
 -  Qualified Manufacturers Listing. See QML
 -  Qualified Parts Listing. See QPL
 -  Quality: 
Section 4: Introduction
 -  Quality assurance: 
Section 4: 
Introduction
 -  Quality conformance inspection. See QCI
 -  Quality factor: 
Appendix 7
 -  Quality Management Plan (QMP): 
Section 2: Chapter 2, 
Appendix 2
 -  Quiescent current: 
Section 3: Chapter 2, 
Section 4: Chapter 1
 
R
S
-  Sacrificial package test: 
Section 4: Chapter 1
 -  Scan design: 
Section 3: Chapter 2, 
Section 3: Chapter 3
 -  Scan path: 
Section 3: Chapter 3
 -  Scan/set logic: 
Section 3: Chapter 3
 -  Scanning electron microscope: 
Section 4: Chapter 1
 -  Schematic capture: 
Section 3: Chapter 2
 -  Schematic correlation: 
Section 3: Chapter 
2
 -  Screening: 
Section 4: Introduction, 
Section 4: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 2, 
Section 4: Chapter 2, 
Section 4: Chapter 3, 
Section 4: Chapter 3, 
Section 4: Chapter 3
 -  SEC. See Standard evaluation circuit
 -  SEE: 
Section 4: Chapter 2, 
Appendix 3
 -  Shift register: 
Section 3: Chapter 2, 
Section 3: Chapter 2, 
Section 3: Chapter 2
 -  SHMOO plots: 
Section 4: Chapter 2
 -  Signature analysis: 
Section 3: Chapter 3
 -  Silicon on insulator (SOI): 
Section 3: Chapter 4, 
Section 3: Chapter 4
 -  Silicon-on-sapphire (SOS): 
Section 3: Chapter 4
 -  Simulation: 
Section 3: Chapter 2
, 
Appendix 1
 -  Simulation/verification tools
 -  Simulator: 
Section 4: Chapter 2, 
Appendix 1
 -  Single-Event Effects (SEE): 
Section 3: Chapter 4
 -  Single-event transients: 
Section 3: Chapter 4:
 -  Single-event upset: 
Section 3: Chapter 4
 -  Slash sheet: 
Section 4: Chapter 3, 
Appendix 2, 
Appendix 2
 -  Snapback: 
Section 3: Chapter 4
 -  Soft macro: 
Section 2: Chapter 4
 -  SPC. See Statistical process 
control
 -  Specification: 
Section 1: Chapter 4, 
Section 3: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 3
 -  Specification, technical
 -  SPICE: 
Appendix 1
 -  Standard cell: 
Section 2: Chapter 3
Section 3: Chapter 2
 -  Standard evaluation circuit (SEC): 
Appendix 2
 -  Standardized military drawing (SMD): 
Appendix 2
 -  Standby current: 
Sectin 4: Chapter 2
 -  State capture, multiple device: 
Section 3: Chapter 2
 -  Statistical process control: 
(SPC): 
Section 4: Chapter 3, 
Appendix 2
 -  Step coverage: 
Section 4: Chapter 1
 -  Structural test: 
Section 2: Chapter 5
 -   Stuck-at fault: 
Section 3: Chapter 2, 
Section 3: chapter 3, 
Section 4: Chapter 1, 
Section 4: chapter 1, 
Section 4: Chapter 4
 -  Subsystem characterization. See Characterization: system
 -  Support groups
 -  Surface-mount technology: 
Section 3: Chapter 3
 -  Synthesis: 
Appendix 1. See HDLs: and synthesis
 -  System
 
T
-  Tasks
 -  TCI: 
Section 4: Chapter 3, 
Section 4: Chapter 3
 -  Technical evaluation: 
Section 2: 
Introduction
 -  Technology characterization vehicle (TCV): 
Appendix 2
 -  Technology conformance inspection. See TCI
 -  Technology review board (TRB): 
Section 4: Chapter 3, 
Appendix 2
 -  Temperature acceleration factor: 
Appendix 7
 -  Temperature cycling: 
Section 4: Chapter 2, 
Section 4: Chapter 3
 -  Test: 
Section 3: Chapter 2, 
Section 3: Chapter 2, 
Section 4: Chapter 1
-   access port (TAP): 
Section 3: Chapter 3
 -   and characterization: 
Section 1: Chapter 1
 -   at-speed functional: 
Section 4: Chapter 1, 
Section 4: Chapter 1. See also 
Fault models: at-speed  functional
 -   data standards: 
Section 3: Chapter 3
 -   designer support of: 
Section 4: Chapter 1
 -   die holder tests: 
Section 4: Chapter 1
 -   fault detection and localization (FDL), IEEE 
PAR f: 
Section 3: Chapter 3
 -   generation: 
Section 3: Chapter 2
 -   generation tools: 
Section 2: Chapter 5
 -   I/O: 
Section 3: Chapter 3
 -   IDDQ: 
Section 4: Chapter 1. See 
also IDDQ testing
 -   internal: 
Section 3: Chapter 3
 -   need for more than one type of: 
Section 4: Chapter 1
 -   requirements and specification language 
(TRSL): 
Section 3: Chapter 3
 -   structure: 
Section 4: Introduction, 
Section 4: Chapter 1, 
Section 4: Chapter 3, 
Section 4: Chapter 3
 -  stuck at fault. See Stuck at fault
 -   testability: 
Section 2: Chapter 3, 
Section 2: Chapter 4
 -   tester limitations: 
Section 4: Chapter 1
 -   to failure: 
Section 4: Chapter 2
 -   transient ionizing irradiation: 
Section 4: Chapter 3
 -   vectors: 
Section 3: Chapter 2, 
Section 4: Chapter 1, 
Section 4: Chapter 1, 
Section 4: Chapter 2, 
Section 4: Chapter 3, 
Section 4: Chapter 3
 
 -  TID: 
Section 4: Chapter 2, 
Section 4: Chapter 3, 
Appendix 3
 -  Time to market: 
Section 3: Chapter 2
 -  Time-dependent dielectric breakdown (TDDB): 
Section 4: Chapter 1, 
Sectin 4: Chapter 3
 -  Timing
 -  Toggle coverage: 
Section 3: Chapter 2
 -  Tools: 
Section 1: Chapter 2, 
Section 2: Chapter 2,
Section 4: Chapter 4
 -  Total Ionizing Dose (TID): 
Section 3: Chapter 4
 -  Total Quality Management (TQM): 
Appendix 2
 -  Transient analyses: 
Appendix 1
 -  Transient phenomena: 
Section 3: Chapter 4
 -  Transistor-transistor logic: 
Section 3: Chapter 2
 -  Translation: 
Appendix 1, 
Appendix 1. See also Modeling: and translation
 -  Translators: 
Appendix 1
 -  TRSL. See Test: requirements and specification 
language
 -  Tunneling: 
Section 4: Chapter 1
 
V
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